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연구실 :
에너지센터508-1

연구실번호 :
3538

이메일 :
jongwlee123@ajou.ac.kr

연구관심분야 :
System-on-chip using 3-D devices and technology

홈페이지 :
학력
졸업연도/학교/학위
1996.08 한국과학기술원 박사
논문 및 연구활동
연구활동(주요논문)
  • [논문] 이종욱, Simulation Study on Scalability Improvement of Logic Transistors with MoS2 Channel and N+/P+ Si Tunnel Junction , INTERNATIONAL JOURNAL OF APPLIED ENGINEERING RESEARCH , Vol.8 , pp.1478 -1482 (Apr, 2017)
  • [논문] 이종욱, Improvement of On-State Current of Tunnel FET (Field-Effect Transistor) by Design of Channel Doping Profile , INTERNATIONAL JOURNAL OF APPLIED ENGINEERING RESEARCH , Vol.11 , No.13 , pp.8019 -8023 (Jul, 2016)
  • [논문] 이종욱, Structural Optimization of Tunnel FET on SOI (Silicon-On-Insulator) substrate for Sub-0.5V Application , INTERNATIONAL JOURNAL OF APPLIED ENGINEERING RESEARCH , Vol.11 , No.10 , pp.6894 -6897 (May, 2016)
  • [논문] 이종욱, Scalability Improvement of Tunnel FET on SOI (Silicon-On-Insulator) with Intrinsic Channel Penetrated into Drain Region , INTERNATIONAL JOURNAL OF APPLIED ENGINEERING RESEARCH , Vol.11 , No.9 , pp.6447 -6450 (May, 2016)
  • [논문] 손용훈, 백승재, 윤의준, 황기현, 신유균, 이종욱, 전상훈, Highly Manufacturable Device Isolation Technology Using Laser-Induced Epitaxial Growth for Monolithic Stack Devices , IEEE TRANSACTIONS ON ELECTRON DEVICES , Vol.58 , No.11 , pp.3863 -3868 (Nov, 2011)
국제학술논문지
  • [논문] 이종욱, Simulation Study on Scalability Improvement of Logic Transistors with MoS2 Channel and N+/P+ Si Tunnel Junction , INTERNATIONAL JOURNAL OF APPLIED ENGINEERING RESEARCH , Vol.8 , pp.1478 -1482 (Apr, 2017)
  • [논문] 이종욱, Improvement of On-State Current of Tunnel FET (Field-Effect Transistor) by Design of Channel Doping Profile , INTERNATIONAL JOURNAL OF APPLIED ENGINEERING RESEARCH , Vol.11 , No.13 , pp.8019 -8023 (Jul, 2016)
  • [논문] 이종욱, Structural Optimization of Tunnel FET on SOI (Silicon-On-Insulator) substrate for Sub-0.5V Application , INTERNATIONAL JOURNAL OF APPLIED ENGINEERING RESEARCH , Vol.11 , No.10 , pp.6894 -6897 (May, 2016)
  • [논문] 이종욱, Scalability Improvement of Tunnel FET on SOI (Silicon-On-Insulator) with Intrinsic Channel Penetrated into Drain Region , INTERNATIONAL JOURNAL OF APPLIED ENGINEERING RESEARCH , Vol.11 , No.9 , pp.6447 -6450 (May, 2016)
  • [논문] 손용훈, 백승재, 윤의준, 황기현, 신유균, 이종욱, 전상훈, Highly Manufacturable Device Isolation Technology Using Laser-Induced Epitaxial Growth for Monolithic Stack Devices , IEEE TRANSACTIONS ON ELECTRON DEVICES , Vol.58 , No.11 , pp.3863 -3868 (Nov, 2011)
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